Exposure mechanism of fullerene derivative electron beam resists

Chemical Physics Letters

Volumn 312, Issue 5-6, 1999, Pages 469-474

  Robinson, A P G ^a   Palmer, R E ^a   Tada, T ^b   Kanayama, T ^b   Shelley, E J ^a   Philp, D ^a   Preece, J A ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001265216     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(99)00871-4     Document Type: Article

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