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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4208-4212

Study on radiation-induced reaction in microscopic region for basic understanding of electron beam patterning in lithographic process (I) - Development of subpicosecond pulse radiolysis and relation between space resolution and radiation-induced reactions of onium salt

(4) Kozawa, Takahiro a Saeki, Akinori a Yoshida, Yoichi a Tagawa, Seiichi a

a OSAKA UNIVERSITY (Japan)

Author keywords

Electron; Electron beam lithography; Line edge roughness; Nanotechnology; Onium salt; Radiation chemistry; Space resolution; Subpicosecond pulse radiolysis

Indexed keywords

ABSORPTION SPECTROSCOPY; ACIDS; IONIZATION; NANOTECHNOLOGY; PHOTORESISTS; POSITIVE IONS; PROTONS; RADIATION CHEMISTRY; RADIOLOGY; RESINS; SURFACE ROUGHNESS;

ELECTRON BEAM PATTERNING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036614041 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.4208 Document Type: Article

Times cited : (62)

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