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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 42-45, 2005, Pages

Resist thickness effect on acid concentration generated in poly(4-hydroxystyrene) film upon exposure to 75 keV electron beam

(5) Shigaki, Takumi a Okamoto, Kazumasa a Kozawa, Takahiro a Yamamoto, Hiroki a Tagawa, Seiichi a

a OSAKA UNIVERSITY (Japan)

Author keywords

Acid concentration; Chemically amplified resist; Electron beam lithography; Resist thickness

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ORGANIC POLYMERS; PATTERN RECOGNITION; PHOTORESISTS; SENSITIVITY ANALYSIS;

ACID CONCENTRATION; CHEMICALLY AMPLIFIED RESISTS; THICKNESS DEPENDENCE;

PLASTIC FILMS;

EID: 30344457569 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.44.L1298 Document Type: Article

Times cited : (6)

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