Factors contributing to sidewall roughness in a positive-tone, chemically amplified resist exposed by x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 2, 1999, Pages 334-344

  Reynolds, Geoffrey W ^a   Taylor, James W ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24644487409     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590560     Document Type: Article

References (26)

1. A. Yahata, S. Urano, and T. Inoue, Jpn. J. Appl. Phys., Part 1 36, 6722 (1997).
2. M. V. Bazylenko, M. Gross, and M. Faith, Appl. Phys. Lett. 69, 2178 (1996).
3. T. Yoshimura, H. Shiraishi, J. Yamamoto, and S. Okazaki, Appl. Phys. Lett. 63, 764 (1993).
4. T. Yamaguchi, H. Namatsu, M. Nagase, K. Yamazaki, and K. Kurihara, Appl. Phys. Lett. 71, 2388 (1997).
5. E. Shiobara, D. Kawarmra, K. Matsunaga, T. Koike, S. Mimotogi, T. Azuma, and U. Onishi, Proc. SPIE 3333, 313 (1998).
6. Y. Martin and H. Wickramasinghe, Appl. Phys. Lett. 64, 2498 (1994).
7. C. Nelson, S. Plamateer, and T. Lyszczarz, Proc. SPIE 3332, 19 (1998).
8. S. Fuller and M. Young, Proc. SPIE 3332, 433 (1998).
9. J. Taylor, P. Dentinger, S. Rhyner, and G. Reynolds, in Polymers for Micro- and Nano-Patterning Science Technology: ACS Symposium Series 706, edited by H. Ito, E. Reichmanis, and O. Nalamasu (American Chemical Society, Washington, DC, 1997), p. 134.
10. G. Reynolds and J. Taylor, Proc. SPIE 3333, 916 (1998).
11. G. Reynolds, S. Rhyner, and J. Taylor, Proceeding of the 11th International Conference on Photopolymers, 1997 (unpublished), p. 369.
12. Larry Melvin, University of Wisconsin-Madison, private communication.
13. V. Koinkar and B. Bhushan, J. Appl. Phys. 81, 2472 (1997).
14. D. He and F. Cerrina, J. Vac. Sci. Technol. B 16, 3748 (1998).
15. Reference 16 contains an excellent review of many dissolution rate models.
16. P. Tsiartas, L. Flanagin, C. Henderson, W. Hinsberg, I. Sanchez, R. Bonnecaze, and C. Willson, Macromolecules 30, 4645 (1997).
17. J. Huang, T. Kwei, and A. Reiser, Macromolecules 22, 4106 (1989).
18. E. Scheckler, T. Ogawa, T. Tanaka, H. Oizumi, and E. Takeda, Jpn. J. Appl. Phys., Part 1 32, 5951 (1993).
19. T. Yoshimura, H. Shiraishi, T. Terasawa, and S. Okazaki, J. Vac. Sci. Technol. B 14, 4216 (1996).
20. C. Nelson Ph.D. thesis, University of Wisconsin, 1996.
21. K. Petrillo, J. Buccignano, M. Angelopoulos, K. Cornell, and W. Brunsvold, J. Vac. Sci. Technol. B 16, 3709 (1998).
22. S. Palmateer, S. Cann, J. Curtin, S. Doran, L. Eriksen, A. Forte, R. Kunz, T. Lyszczarz, C. Nelson, and M. Stern, Proc. SPIE 3333, 634 (1998).
23. W. Hinsberg, F. Houle, J. Hoffnagle, M. Sanchez, M. Morrison, C. Nguygen, and S. Frank, J. Vac. Sci. Technol. B 16, 3689 (1998).
24. S. Rhyner and J. Taylor, J. Vac. Sci. Technol. B 15, 2627 (1997).
25. S. Bollepalli, S. Hector, J. Maldonado, and J. Leavey, Proc. SPIE 3048, 155 (1997).
26. J. Guo and F. Cerrina, Proc. SPIE 1924, 382 (1993).