Relationship between acid generator concentration and acid yield in chemically amplified electron beam resist

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 7, 2006, Pages 5735-5737

  Shigaki, Takumi ^a   Okamoto, Kazumasa ^a   Kozawa, Takahiro ^a   Yamamoto, Hiroki ^a   Tagawa, Seiichi ^a   Kai, Toshiyuki ^a   Shimokawa, Tsutomu ^b  

^a OSAKA UNIVERSITY   (Japan)

^b JSR CORPORATION   (Japan)

Author keywords

Acid generator; Chemically amplified resist; Electron beam lithography; PHS; PMMA

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; IONIZATION; POLYMERS; POLYMETHYL METHACRYLATES; STYRENE;

ACID GENERATOR; CHEMICALLY AMPLIFIED RESIST; PHS; PMMA;

ELECTRON BEAMS;

EID: 33746809013     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.5735     Document Type: Article

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