Dependence of acid yield on acid generator in chemically amplified resist for post-optical lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5832-5835

  Nakano, Atsuro ^a   Okamoto, Kazumasa ^a   Yamamoto, Yukio ^a   Kozawa, Takahiro ^a   Tagawa, Seiichi ^a   Kai, Toshiyuki ^b   Nemoto, Hiroaki ^b  

^a OSAKA UNIVERSITY   (Japan)

^b JSR CORPORATION   (Japan)

Author keywords

Acid generator; Acid yield; Poly(methyl methacrylate); Post optical lithography; Reaction mechanism

Indexed keywords

ELECTRON BEAMS; IONIZING RADIATION; PHOTOLITHOGRAPHY; POLYMETHYL METHACRYLATES; REACTION KINETICS;

ACID GENERATORS; ACID YIELD; POST-OPTICAL LITHOGRAPHY;

PHOTORESISTS;

EID: 31844448318     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5832     Document Type: Article

References (18)

1. H. Ito and C. G. Willson: Polym. Eng. Sci. 23 (1983) 1012.
2. S. P. Pappas, B. C. Pappas and L. R. Gatechair: J. Polym. Sci. Polym. Chem. Ed. 22 (1984) 69.
3. J. L. Dektar and N. P. Hacker: J. Org. Chem. 55 (1990) 639.
4. N. P. Hacker, D. C. Hofer and K. M. Welsh: J. Photopolym. Sci. Technol. 5 (1992) 35.
5. J. F. Cameron, N. Chan, K. Moore and G. Pohlers: Proc. SPIE 4345 (2001) 106.
6. S. Tagawa, S. Nagahara, T. Iwamoto, M. Wakita, T. Kozawa, Y. Yamomoto, D. Werst and A. D. Trifunac: Proc. SPIE 3999 (2000) 204.
7. T. Kozawa, Y. Yoshida, M. Uesaka and S. Tagawa: Jpn. J. Appl. Phys. 31 (1992) 4301.
8. T. Kozawa, A. Saeki, A. Nakano, Y. Yoshida and S. Tagawa: J. Vac. Sci. & Technol. B 21 (2003) 3149.
9. T. Kozawa, A. Saeki and S. Tagawa: J. Vac. Sci. & Technol. B 22 (2004) 3489.
10. A. Nakano, K. Okamoto, T. Kozawa and S. Tagawa: Jpn. J. Appl. Phys. 43 (2004) 3981.
11. ) T. Kozawa, S. Nagahara, Y. Yoshida and S. Tagawa: J. Vac. Sci. & Technol. B 15 (1997) 2582.
12. H. Yamamoto, A. Nakano, K. Okamoto, T. Kozawa and S. Tagawa: Jpn. J. Appl. Phys. 43 (2004) 3971.
13. A. Nakano, K. Okamoto, T. Kozawa and S. Tagawa: Jpn. J. Appl. Phys. 43 (2004) 4363.
14. S. Nagahara, Y. Yamashita, T. Taguchi, T. Kozawa, Y. Yoshida and S. Tagawa: Jpn. J. Appl. Phys. 35 (1996) 6491.
15. S. Tsuji, T. Kozawa, Y. Yamamoto and S. Tagawa: J. Photopolym. Sci. Technol. 13 (2000) 733.
16. O. Wollersheim, H. Zumaque, J. Hormes, D. Kadereit, J. Langen, L. Haubling, P. Hoessel and G. Hoffmann: Nucl. Intsrum. & Methods B 97 (1995) 273.
17. S. Tatro, G. Baker, K. Bisht and J. Harmon: Polymer 44 (2003) 167.
18. S. Nagahara, Y. Sakurai, M. Wakita, Y. Yamamoto, S. Tagawa, M. Komuro, E. Yano and S. Okazaki: Proc. SPIE 3999 (2000) 386.