Effects of ester groups on proton generation and diffusion in polymethacrylate matrices

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3981-3983

  Nakano, Atsuro ^a   Okamoto, Kazumasa ^a   Kozawa, Takahiro ^a   Tagawa, Seiichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Line edge roughness; Lithography; Polymethacrylate; Proton diffusion; Resist sensitivity; Spatial resolution

Indexed keywords

LINE EDGE ROUGHNESS; POLYMETHACRYLATES; PROTON DIFFUSION; RESIST SENSITIVITY; SPATIAL RESOLUTION;

CATALYSIS; CHARGE TRANSFER; DIFFUSION; ELECTRON BEAMS; ESTERS; EXCIMER LASERS; IONIZING RADIATION; LITHOGRAPHY; RADIOLYSIS; REACTION KINETICS;

POLYMETHYL METHACRYLATES;

EID: 4444245821     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3981     Document Type: Conference Paper

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