Measurement of the backscatter coefficient using resist response curves for 20-100 keV electron beam lithography on Si

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4277-4282

  Watson, G Patrick ^a   Fu, Diana ^b   Berger, Steven D ^c   Tennant, Donald ^a   Fetter, Linus ^a   Novembre, Anthony ^a   Biddick, Christopher ^a  

^a LUCENT TECHNOLOGIES   (United States)

^b Stanford University   (United States)

^c Integrated Solutions Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010320182     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588590     Document Type: Article

References (8)

1. G. P. Watson, S. D. Berger, J. A. Liddle, L. A. Fetter, R. C. Farrow, R. G. Tarascon, M. Mkrtchyan, A. E. November, M. I. Blakey, and K. J. Bolan, J. Vac. Sci. Technol. B 13, 2535 (1995).
2. S. A. Rishton and D. P. Kern, J. Vac. Sci. Technol. B 5, 135 (1987).
3. M. Parikh and D. F. Kyser, J. Appl. Phys. 50, 1104 (1979).
4. L. D. Jackel, R. E. Howard, P. M. Mankiewich, H. G. Craighead, and R. W. Epworth, Appl. Phys. Lett. 45, 698 (1984).
5. L. Stevens, R. Jonckheere, E. Froyen, S. Decoutere, and D. Lanneer, Microelectron. Eng. 5, 141 (1986).
6. D. F. Kyser, D. E. Schreiber, C. H. Ting, and R. Pyle, International Conference on Electron Beam Lithography (The Electrochemical Society, Pennington, NJ, 1980).
7. R. G. Tarascon, K. Bolan, M. Blakey, R. M. Camarda, R. C. Farrow, L. A. Fetter, H. A. Huggins, J. S. Kraus, J. A. Liddle, D. A. Nixon, A. E. Novembre, G. P. Watson, and S. D. Berger, J. Vac. Sci. Technol. B 12, 3444 (1994).
8. K. Cummings and J. D. Resnick, J. Vac. Sci. Technol. B 6, 2033 (1989).