Analysis of line edge roughness using probability process model for chemically amplified resists

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3748-3754

  Fukuda, Hiroshi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Chemically amplified resist (CAR); Diffusion; Dissolution; Dissolution rate; Line edge roughness (LER); Percolation; Polymer; Reaction

Indexed keywords

CATALYSTS; DIFFUSION; DISSOLUTION; PROBABILITY;

LINE EDGE ROUGHNESS (LER);

POLYMERS;

EID: 0041862564     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3748     Document Type: Conference Paper

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