Evaluation of carbon-doped low-k multilayer structure by nanoindentation

Journal of Alloys and Compounds

Volumn 448, Issue 1-2, 2008, Pages 293-297

  Fujikane, M ^a,b   Nagao, S ^a   Liu, X W ^a   Chrobak, D ^a   Lehto, A ^a   Yamanaka, S ^b   Nowak, R ^a  

^a AALTO UNIVERSITY   (Finland)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Coating materials; Elasticity; Insulators; Mechanical properties; Thin films

Indexed keywords

COATED MATERIALS; ELASTICITY; ELECTRIC INSULATORS; NANOINDENTATION; SILICON WAFERS; THIN FILMS;

FILMS TESTING; MICROSCOPIC INSPECTION; REGISTERED NANOINDENTATION DATA; SHARP CUBE-CORNER INDENTER;

MULTILAYER FILMS;

EID: 35748969292     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2006.10.089     Document Type: Article

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