Substrate biasing effect on the electrical properties of magnetron-sputtered high-k titanium silicate thin films

Journal of Applied Physics

Volumn 102, Issue 3, 2007, Pages

  Brassard, D ^a   El Khakani, M A ^a   Ouellet, L ^b  

^a INSTITUT NATIONAL DE LA RECHERCHE SCIENTIFIQUE   (Canada)

^b DALSA Semiconductor Inc   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS VOLTAGE; MAGNETRON SPUTTERING; PERMITTIVITY; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

SUBSTRATE BIAS VOLTAGE (VS); SUBSTRATE BIASING EFFECTS;

THIN FILMS;

EID: 34548012649     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2759196     Document Type: Article

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