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Volumn 24, Issue 3, 2006, Pages 600-605

Compositional effect on the dielectric properties of high- k titanium silicate thin films deposited by means of a cosputtering process

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC LOSSES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LEAKAGE CURRENTS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33646558003     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2180267     Document Type: Article
Times cited : (31)

References (28)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.