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Physica B: Condensed Matter

Volumn 352, Issue 1-4, 2004, Pages 118-126

XPS study for reactively sputtered titanium nitride thin films deposited under different substrate bias

(5) Jiang, Ning a Zhang, H J a Bao, S N a Shen, Y G b Zhou, Z F b

a ZHEJIANG UNIVERSITY (China)

b CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

AFM; Binding energy; Chemical states; Magnetron sputtering; TiN; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; BINDING ENERGY; COMPOSITION; MAGNETRON SPUTTERING; MICROSTRUCTURE; STOICHIOMETRY; SURFACES; THERMODYNAMICS; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

BULK MATERIALS; CHEMICAL PROPERTIES; CHEMICAL STATES; SPUTTER-DEPOSITED FILMS;

THIN FILMS;

EID: 5444223725 PISSN: 09214526 EISSN: None Source Type: Journal
DOI: 10.1016/j.physb.2004.07.001 Document Type: Article

Times cited : (136)

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