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Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 5831-5839

Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering

(2) Kim, Joo Han a Chung, Ki Woong a

a LG (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001388985 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.367440 Document Type: Article

Times cited : (113)

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