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Journal of Applied Physics

Volumn 90, Issue 3, 2001, Pages 1501-1508

Investigation and modeling of the electrical properties of metal-oxide-metal structures formed from chemical vapor deposited Ta2O5films

(3) Blonkowski, S a Regache, M a Halimaoui, A a

a ORANGE LABS (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035424175 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1381043 Document Type: Article

Times cited : (107)

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