Thermal stability of amorphous Ti3Si1O8 thin films

Microelectronic Engineering

Volumn 55, Issue 1-4, 2001, Pages 183-188

  Giauque, P H ^a   Cherry, H B ^b   Nicolet, M A ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BACKSCATTERING; COMPOSITION EFFECTS; CRYSTALLIZATION; OPTICAL FILMS; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; THIN FILMS; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

BACKSCATTERING SPECTROMETRY; REACTIVE SPUTTERING; TERNARY OXIDES;

AMORPHOUS FILMS;

EID: 0034825188     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00446-9     Document Type: Article

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