Microstructure and optical properties of amorphous TiO2-SiO2 composite films synthesized by helicon plasma sputtering

Thin Solid Films

Volumn 338, Issue 1-2, 1999, Pages 105-109

  Wang, Xinrong ^a   Masumoto, Hiroshi ^a   Someno, Yoshihiro ^b   Hirai, Toshio ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b ALPS ELECTRIC CO LTD   (Japan)

Author keywords

Optical properties; Plasma processing and deposition; Silicon oxide; Titanium oxide

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL ORIENTATION; MORPHOLOGY; OPTICAL GLASS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SILICA; SPUTTER DEPOSITION; SUBSTRATES; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HELICON PLASMA SPUTTERING;

OPTICAL FILMS;

EID: 0032715784     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01007-4     Document Type: Article

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