Integrated lithographic molding for microneedle-based devices

Journal of Microelectromechanical Systems

Volumn 16, Issue 4, 2007, Pages 872-884

  Luttge, Regina ^a   Berenschot, Erwin J W ^a   de Boer, Meint J ^a   Altpeter, Dominique M ^a   Vrouwe, Elwin X ^a,b   van den Berg, Albert ^a   Elwenspoek, Miko ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b Micronit Microfluidics   (Netherlands)

Author keywords

Blood; Deep reactive ion etching (DRIE); Diagnostics; Lithographic molding; Microneedle; Multilayer lithography; Point of Care; Preprocessed substrate; SU 8

Indexed keywords

ASPECT RATIO; ELECTROPHORESIS; LITHOGRAPHY; MOLDING; PHOTORESISTS; REACTIVE ION ETCHING;

LITHOGRAPHIC MOLDING; MICRONEEDLE-BASED DEVICE; POINT-OF-CARE; PREPROCESSED SUBSTRATE;

MICROELECTROMECHANICAL DEVICES;

EID: 34548010067     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2007.899339     Document Type: Article

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