High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1997, Pages 518-522

  Despont, M ^a   Lorenz, H ^a   Fahrni, N ^a   Brugger, J ^a   Renaud, P ^a   Vettiger, P ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; EPOXY RESINS; MECHANICAL PROPERTIES; MICROELECTROMECHANICAL DEVICES; REFLECTIVE COATINGS; ULTRAVIOLET RADIATION;

NEGATIVE TONE PHOTORESISTS;

PHOTORESISTS;

EID: 0030677606     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)