Surface modification with self-assembled monolayers for nanoscale replication of photoplastic MEMS

Journal of Microelectromechanical Systems

Volumn 11, Issue 3, 2002, Pages 175-181

  Kim, Gyu Man ^a,b   Kim, Beomjoon ^a,c   Liebau, Maik ^d,e   Huskens, Jurriaan ^d   Reinhoudt, David N ^d   Brugger, Jürgen ^a,b  

^a Strategic Research Orientation Nanolink   (Netherlands)

^b EPFL   (Switzerland)

^c INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^d UNIVERSITY OF TWENTE   (Netherlands)

^e INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

MEMS; Nanoscale; Replication; Self assembled monolayer (SAM); SU 8

Indexed keywords

SURFACE TRANSFER TECHNIQUES;

ALUMINUM; ELECTRODES; ETCHING; MOLDING; NANOTECHNOLOGY; SELF ASSEMBLY; SILICA; SURFACE TREATMENT; THICK FILMS; THIN FILMS;

MICROELECTROMECHANICAL DEVICES;

EID: 0036600502     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2002.1007395     Document Type: Article

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