Photolithography in anisotropically etched grooves

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1996, Pages 38-43

  Linder, S ^a   Baltes, H ^a   Gnaedinger, F ^a   Doering, E ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; ELECTRODEPOSITION; ETCHING; FABRICATION; IMAGE QUALITY; PHOTORESISTS; PHOTOSENSITIVITY; POLYMERS; PRINTING; SILICON WAFERS; SURFACES; THREE DIMENSIONAL;

ACCELERATION SENSORS; ANISOTROPIC ETCHING; DIFFRACTION EFFECTS; INFRARED SENSORS; PRESSURE SENSORS;

PHOTOLITHOGRAPHY;

EID: 0029751903     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)