In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

Sensors and Actuators, A: Physical

Volumn 111, Issue 1, 2004, Pages 87-92

  Sato, Hironobu ^a   Kakinuma, Takayuki ^a   Go, Jeung Sang ^a   Shoji, Shuichi ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

3 D micromesh structure; Backside exposure; In channel microfilter; SU 8

Indexed keywords

ASPECT RATIO; ELECTRIC FILTERS; HYDRODYNAMICS; MASKS; PHOTOLITHOGRAPHY; SUBSTRATES; ULTRAVIOLET RADIATION;

IN-CHANNEL MICROFILTERS; MICROMESH STRUCTURES;

ELECTRONICS PACKAGING;

EID: 0442280359     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2003.10.009     Document Type: Conference Paper

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