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Volumn 46, Issue 5 B, 2007, Pages 3244-3254

Si(001) surface layer-by-layer oxidation studied by real-time photoelectron spectroscopy using synchrotron radiation

Author keywords

Band bending; Layer by layer oxidation; Point defect generation; Real time monitoring; Si surface; Strained Si layer; Synchrotron radiation; XPS

Indexed keywords

ENERGY GAP; INTERFACES (MATERIALS); POINT DEFECTS; SILICON; STRAIN RATE; SYNCHROTRON RADIATION;

EID: 34547908950     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.3244     Document Type: Article
Times cited : (33)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.