Combined absorber stack for optimization of the EUVL mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Lee, Seung Yoon ^a   Kim, Tae Geun ^a   Kim, Chung Yong ^a   Kang, In Yong ^a   Chung, Yong Chae ^a   Ahn, Jinho ^a  

^a Hanyang University   (South Korea)

Author keywords

Absorber; Absorber stack; Al2O3; ARC; Buffer; Capping; EUVL; Reflectivity; TaN

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; LITHOGRAPHY; OPTIMIZATION; RUTHENIUM; TANTALUM COMPOUNDS; ULTRAVIOLET RADIATION;

DUV WAVELENGTH; OPTIMUM THICKNESS; PATTERN FIDELITY; ULTRAVIOLET ABSORBERS;

MASKS;

EID: 33745623367     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656928     Document Type: Conference Paper

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