Reduction of the absorber shadow effect by changing the absorber side wall angle in extreme ultraviolet lithography

Journal of the Korean Physical Society

Volumn 46, Issue 4, 2005, Pages 1020-1024

  Yoo, Myoung Sul ^a   Jeon, Young Doo ^a   Hye Keun, O H ^a   Ahn, Jin Ho ^b  

^a Hanyang University   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

Aerial image; Euv lithography; Euv mask; Near held; Shadow effect

Indexed keywords

EID: 17744384738     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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