Characterization of the manufacturability of ultrathin resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3039-3042

  Nguyen, Khanh B ^a   Lyons, Chris ^a   Schefske, Jeff ^a   Pike, Chris ^a   Phan, Khoi ^a   King, Paul ^a   Levinson, Harry ^a   Bell, Scott ^a   Okoroanyanwu, Uzodinma ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033269284     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590950     Document Type: Article

References (10)

1. T. M. Bloomstein, M. Rothschild, R. R. Kunz, D. E. Hardy, and R. B. Goodman, J. Vac. Sci. Technol. B 16, 3154 (1998).
2. B. L. Henke, E. M. Gullikson, and J. C. Davis, At. Data Nucl. Data Tables 54, 181 (1993).
3. F. B. Wyart and J. Daillant, Can. J. Phys. 68, 1084.
4. K. P. Muller and H. S. Sachdev, J. Vac. Sci. Technol. B 10, 2560 (1992).
5. K. Early et al., Appl. Opt. 32, 7044 (1993).
6. S. W. J. Kuan et al., J. Vac. Sci. Technol. B 6, 2274 (1988).
7. R. R. Kunz and M. W. Horn, Polym. Eng. Sci. 32, 1595 (1991).
8. V. Rao, J. Cobb, C. Henderson, U. Okoroanyanwu, D. Bozman, P. Mangat, R. Brainard, and J. Mackevich, Proc. SPIE (to be published).
9. H. Bender, Jan Vanhellemont, and R. Schmolke, Jpn. J. Appl. Phys., Part l 36, 1217 (1997).
10. D. Graf, M. Suhren, U. Lambert, R. Schmolke, A. Ehlert, W. von Ammon, and P. Wagner, J. Electrochem. Soc. 145, 275 (1998).