Novel design of Att-PSM structure for extreme ultra violet lithography and enhancement of image contrast during inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 481-494

  Han, Sang In ^a   Wasson, James R ^a   Mangat, Pawitter J S ^a   Cobb, Jonathan L ^a   Lucas, Kevin ^a   Hector, Scott D ^a  

^a MOTOROLA INC   (United States)

Author keywords

Attenuated phase shift masks; Contact holes; Extreme ultraviolet lithography; Masks; Phase shift masks

Indexed keywords

ABERRATIONS; BANDWIDTH; COHERENT LIGHT; COMPUTER SIMULATION; DISSOLUTION; ELECTROMAGNETIC WAVE ATTENUATION; ELECTROMAGNETIC WAVE DIFFRACTION; IMAGE ENHANCEMENT; LIGHT REFLECTION; MASKS; OPTICAL MULTILAYERS; OPTICAL TRANSFER FUNCTION; PHASE SHIFT; PROJECTION SYSTEMS; THIN FILMS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0036379010     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472324     Document Type: Conference Paper

References (11)

1. Vladimir V. Ivin, Kevin D. Lucas, Tariel Makhviladze, Vadim V. Manuilov and Marina G. Medvedeva, "Extension of the traditional optical model for investigation into the EUV projection lithography capabilities," Emerging Lithographic Technologies II, SPIE volume 3331, 646-54, (1998).
2. "International Technology Roadmap for Semiconductors 2001 Edition," Semiconductor Industry Assoc. with EECA, KSIA, JEITA, and TSIA, 2001. See http://public.itrs.net/Files/2001ITRS/Home.htm.
3. Weilun Chao, Eric Gullikson, and David Attwood, "Equivalent Multilayer Bandwidth and Comparison between 13.4 nm and 14.4 nm for EUV Throughput Calculation," Emerging Lithographic Technologies V, SPIE vol. 4343, (2001).
4. Stearns et al., "Nonspecular x-ray scattering in a multilayer-coated imaging system," J. Appl. Phys. 84, 1003 (1998).
5. Christof Krautschik, Masaaki Ito, and Iwao Nishiyama, "Impact of EUV Light Scatter on CD Control as a result of Mask Density Changes," to be published in Emerging Lithographic Technologies VI, SPIE Proceedings volume 4688, 2002.
6. Tom Pistor, "Electromagnetic simulation and modeling with applications in lithography," Ph.D. thesis, University of California, Berkeley, Electrical Engineering, Chapter 5, May 2001.
7. 3 1(1), 7-12, April 2002.
8. D. Atwood, Soft X-Ray and Extreme Ultraviolet Radiation, Cambridge, 1999.
9. E. Spiller, Soft X-Ray Optics (SPIE, Bellingham,WA, 1994)
10. B.L.Henke, E.M. Gullikson, and J.C.Davis," Atomic Data and Nuclear Data Tables 54, 181-342(1993).
11. D. W. Pettibone, A. Veldman, T. Liang, A. R. Silvers, P. J. Mangat, B. Lu, J. Wasson, S. D. Hector, K. L. Blaedel, D. P. Mathur and E. Fisch, "Inspection of EUV reticles," to be published in Emerging Lithographic Technologies VI, SPIE Proceedings volume 4688, 2002.