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Volumn 21, Issue 6, 2003, Pages 3086-3090
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Extreme ultraviolet mask fabrication with high inspection contrast TaSiN x absorber stack
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Author keywords
[No Author keywords available]
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Indexed keywords
CRITICAL DIMENSIONS (CD);
EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);
IMAGE PLACEMENT (IP);
OUT OF PLANE DISTORTION (OPD);
ANTIREFLECTION COATINGS;
ELECTRON BEAMS;
ETCHING;
LIGHT ABSORPTION;
PHOTOLITHOGRAPHY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
TANTALUM COMPOUNDS;
THIN FILMS;
ULTRAVIOLET RADIATION;
MASKS;
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EID: 0942300017
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: None Document Type: Conference Paper |
Times cited : (9)
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References (17)
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