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Volumn 21, Issue 6, 2003, Pages 3086-3090

Extreme ultraviolet mask fabrication with high inspection contrast TaSiN x absorber stack

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL DIMENSIONS (CD); EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); IMAGE PLACEMENT (IP); OUT OF PLANE DISTORTION (OPD);

EID: 0942300017     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (9)

References (17)
  • 12
    • 0038303209 scopus 로고    scopus 로고
    • V. Boegli et al., Proc. SPIE 4889, 283 (2002).
    • (2002) Proc. SPIE , vol.4889 , pp. 283
    • Boegli, V.1
  • 16
    • 0942278437 scopus 로고    scopus 로고
    • Mechanical Engineering Dept., University of Wisconsin, Madison, Wisconsin (private communication)
    • E. G. Lovell, Mechanical Engineering Dept., University of Wisconsin, Madison, Wisconsin (private communication).
    • Lovell, E.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.