Mask blanks for extreme ultraviolet lithography: Ion beam sputter deposition of low defect density Mo/Si multilayers

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2452-2454

  Kearney, P A ^a   Moore, C E ^a   Tan, S I ^a   Vernon, S P ^a   Levesque, R A ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000522975     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589665     Document Type: Article

References (7)

1. A. M. Hawryluk, OSA Proceedings on Soft X-Ray Projection Lithography, edited by A. M. Hawryluk and R. H. Stulen (Optical Society of America, Washington, DC, 1993), Vol. 18, pp. 43-46.
2. G. S. Selwyn, J. Singh, and R. S. Bennett, J. Vac. Sci. Technol. A 7, 2758 (1989).
3. S. P. Vernon and F. W. Weber (unpublished study).
4. High Yield Technologies, Sunnyvale, CA or see P. Borden, Microcontamination, January, 1991 (unpublished).
5. Tencor, Mountain View, CA.
6. ASYST Technologies, Inc., Freemont, CA or see A. C. Bonora, Solid State Technol. 36, 49 (1993).
7. VEECO Instruments Inc., Microetch, Ion Beam Systems, Plainview, NY 11803.