EUV Mask Making: An Approach Based on the Direct Patterning of the EUV Reflector

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 566-572

  Chovino, Christian ^a   Dieu, Laurent ^a   Johnstone, Eric ^a   Reyes, Julio ^a   La Fontaine, Bruno ^b   Levinson, Harry J ^b   Pawloski, Adam ^b  

^a DuPont Photomasks Inc   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

EUV AAPSM; EUV Binary; EUV EAPSM; EUV Mask process; Mo Si multilayer Etch

Indexed keywords

COMPUTER SIMULATION; ETCHING; INSPECTION; LITHOGRAPHY; MAGNETOELECTRIC EFFECTS; MULTILAYERS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); OPTICAL INSPECTION;

MASKS;

EID: 1842579646     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518259     Document Type: Conference Paper

References (7)

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3. Emily Fish, Louis Kindt, Michael Lercel, Ken Racette, Carey Williams, EUVL Mask Fabrication for the 45-nm Node, Photomask and Next-Generation Lithography Mask Technology IX, Proceeding of SPIE Vol. 4754, p-865-871 (2002).
4. C. Khan Malek, F.R. Ladan, M. Carre, R. Rivoira, Reactive Ion Etching of Multyilayer Mirrors for X-ray Projection Lithography Masks, Microelectronic Engineering 13, p-283-286 (1991).
5. Tsutomo Shoki, Morio Hosoya, Takeru Kinoshita, Hideo Kobayashi, Youichi Usui, Ryo Ohkubo, Shinichi Ishibashi, Osamu Nagarekawa, Process development of 6-inch EUV mask with TaBN absorber, Photomask and Next Generation Lithography Mask Technology IX, Proceedings of SPIE Vol. 4754, p-857-864 (2002).
6. nd Annual BACUS Symposium on Photomask Technology, Proceedings of SPIE Vol. 4889, p-431-436 (2002).
7. Panoramic Technology, http://www.panoramictech.com