Defect repair for extreme ultraviolet lithography (EUVL) mask blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 331-338

  Hau Riege, Stefan P ^a   Barty, Anton ^a   Mirkarimi, Paul B ^a   Stearns, Daniel G ^a   Chapman, Henry ^a   Sweeney, Don ^a   Clift, Miles ^b   Gullikson, Eric ^c   Yi, Moon Suk ^c  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Defect repair; Extreme ultraviolet lithography; Mask blanks

Indexed keywords

CARBON; DEFECTS; DEPOSITION; OPTICAL MULTILAYERS; PHOTOLITHOGRAPHY; REFLECTION; SILICON;

DEFECT REPAIR; EXTREME ULTRAVIOLET LITHOGRAPHY; MASK BLANKS; MULTILAYER DEPOSITION;

MASKS;

EID: 0141501368     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484729     Document Type: Conference Paper

References (7)

1. P.B. Mirkarimi, E.A. Spiller, D.G. Stearns, V. Sperry, and S.L. Baker, An ion-assisted Mo-Si deposition process for planarizing reticle substrates for extreme ultraviolet lithography, Quant. Elect. Lett. 37, 1514 (2001).
2. EUV Mask and Chuck Standard SEMI P38-1102, published by International SEMATECH (2002).
3. P.B. Mirkarimi, D.G. Stearns, S.L. Baker, J.W. Elmer, D.W. Sweeney, and E.M. Gullikson, Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography, J. Appl. Phys. 91, 81 (2002).
4. D.G. Stearns, P.B. Mirkarimi, and E. Spiller, Localized defects in EUV multilayer coatings, submitted for publication.
5. A. Barty, S.P. Hau-Riege, H. Chapman, P.B. Mirkarimi, D.G. Steans, D. Sweeney, M. Clift, and E. Gullikson, A method for repairing amplitude defects in multilayer-coated EUV mask blanks, to be submitted.
6. S.D. Hector, P.A. Kearney, C. Montcalm, J.A. Folta, C.C. Walton, W.M. Tong, J.S. Taylor, P.-Y. Yan, and C. Gwyn, Predictive model of the cost of extreme ultraviolet lithography masks, Proc. SPIE 4186, 733 (2001).
7. B.L. Henke, E.M. Gullikson, and J.C. Davis, X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-3000 eV, Z=1-92, Atomic Data and Nuclear Data Tables 54, 181 (1993).