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Volumn 5256, Issue 2, 2003, Pages 1281-1286

EUVL Mask with Ru ML Capping

Author keywords

EUVL mask processing; EUVL ML mask blank; Ru capped ML

Indexed keywords

LIGHT ABSORPTION; LIGHT REFLECTION; PHOTOLITHOGRAPHY; RUTHENIUM; SILICA; SILICON; TANTALUM COMPOUNDS;

EID: 1842579509     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.520024     Document Type: Conference Paper
Times cited : (31)

References (2)
  • 2
    • 84862354939 scopus 로고    scopus 로고
    • EUVL mask SEMI standards (http://www.semi.org/PUBS/SEMIPUBS.NSF/ 94fa0e7958a87ffb882565f6000cf3aa!OpenView&Start=38)
    • EUVL Mask SEMI Standards


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.