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Volumn 5256, Issue 2, 2003, Pages 1281-1286
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EUVL Mask with Ru ML Capping
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Author keywords
EUVL mask processing; EUVL ML mask blank; Ru capped ML
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Indexed keywords
LIGHT ABSORPTION;
LIGHT REFLECTION;
PHOTOLITHOGRAPHY;
RUTHENIUM;
SILICA;
SILICON;
TANTALUM COMPOUNDS;
CAPPING;
EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL);
MASKS;
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EID: 1842579509
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.520024 Document Type: Conference Paper |
Times cited : (31)
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References (2)
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