Extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3142-3149

  Gwyn, C W ^a   Stulen, R ^b   Sweeney, D ^b   Attwood, D ^b  

^a EUV LLC   (United States)

^b VNL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000130079     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590453     Document Type: Article

References (8)

1. A. M. Hawryluk and L. G. Seppala, J. Vac. Sci. Technol. B 6, 2162 (1988).
2. W. T. Silfvast and O. R. Wood II, Microelectron. Eng. 8, 3 (1988).
3. H. Kinoshita, K. Kurihara, Y. Ishii, and Y. Torii, J. Vac. Sci. Technol. B 7, 1648 (1989).
4. J. E. Bjorkholm et al., J. Vac. Sci. Technol. B 8, 1509 (1990).
5. Extreme Ultraviolet Lithography, a white paper prepared by Charles Gwyn et al., EUV LLC, Sept. 1997.
6. Synchrotron radiation sources and condenser for projection x-ray lithography, J. B. Murphy, D. L. White, A. A. MacDowell, and O. R. Wood II, Appl. Opt. 32, 6920 (1993).
7. D. A. Tichenor et al., Opt. Lett. 16, 557 (1991).
8. G. D. Kubiak et al., 1996 OSA TOPS on Extreme Ultraviolet Lithography, edited by G. D. Kubiak and Kania (Optical Society of America, 1996), Vol. 4.