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Volumn 771, Issue , 2005, Pages 108-117

Recent progress in the development of sources for EUV lithography

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Indexed keywords


EID: 28344444664     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.1944698     Document Type: Conference Paper
Times cited : (12)

References (41)
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    • Schmidt, V.1
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    • www-cxro.lbl.gov/optical_constants/multi2.html.
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    • M. Lysaght, N. Murphy, A Cummings G.O'Sullivan, D. Kilbane, P. van Kampen, and J. T. Costello, 2004 to be published
    • M. Lysaght, N. Murphy, A Cummings G.O'Sullivan, D. Kilbane, P. van Kampen, and J. T. Costello, 2004 to be published.
  • 33
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    • A user guide for the laser-plasma simulation code: MED103
    • Central Laser Facility, Rutherford Appleton Library
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    • (1996) Technical Report , vol.RAL-TR-96-099
    • Djaoui, A.1
  • 38
    • 33749462134 scopus 로고    scopus 로고
    • Japan MEXT leading project for laser-produced plasma EUV light source development
    • Antwerp
    • nd EUVL Symposium, Antwerp, (2002).
    • (2002) nd EUVL Symposium
    • Nishihara, K.1
  • 41
    • 24644470790 scopus 로고    scopus 로고
    • Prepulae enchanced EUV yield from gas-jet laser-produced plasma
    • G. Kooijman, R. de Bruijn, K. Koshelev, and F. Bijkerk, "Prepulae Enchanced EUV Yield From Gas-jet Laser-Produced Plasma", CLF Annual Report, 142-144 (2001/2002).
    • (2001) CLF Annual Report , pp. 142-144
    • Kooijman, G.1    De Bruijn, R.2    Koshelev, K.3    Bijkerk, F.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.