Opacity of neutral and low ion stages of Sn at the wavelength 13.5 nm used in extreme-ultraviolet lithography

Physical Review A - Atomic, Molecular, and Optical Physics

Volumn 72, Issue 1, 2005, Pages

  Lysaght, M ^a   Kilbane, D ^b   Murphy, N ^a   Cummings, A ^a   Dunne, P ^a   O'Sullivan, G ^a  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

^b DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ION SOURCES; LASER PRODUCED PLASMAS; LITHIUM; LITHOGRAPHY; PHOTOIONIZATION; TIN; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); PHOTOABSORPTION; PLASMA MODELS; RADIATION TRANSPORT;

OPACITY;

EID: 33244465194     PISSN: 10502947     EISSN: 10941622     Source Type: Journal    
DOI: 10.1103/PhysRevA.72.014502     Document Type: Article

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