High power EUV sources for lithography - A comparison of laser produced plasma and gas discharge produced plasma

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 122-133

  Stamm, Uwe ^a   Ahmad, Imtiaz ^a   Borisov, Vladimir M ^b   Flohrer, Frank ^a   Gäbel, Kai ^a   Götze, Sven ^a   Ivanov, Alexander S ^b   Khristoforov, Oleg B ^b   Klöpfel, Diethard ^a   Köhler, Peter ^a   Kleinschmidt, Jürgen ^a   Korobotchko, Vladimir ^a   Ringling, Jens ^a   Schriever, Guido ^a   Vinokhodov, Alexander Y ^b  

^a XTREME Technologies GmbH   (Germany)

^b TROITSK INSTITUTE FOR INNOVATION AND FUSION RESEARCH   (Russian Federation)

Author keywords

EUV lithography; EUV sources; Gas discharge produced plasma; Laser produced plasma; Z pinch

Indexed keywords

EXCIMER LASERS; LIGHT EMISSION; MICROPROCESSOR CHIPS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

GAS DISCHARGE PRODUCED PLASMAS;

LASER PRODUCED PLASMAS;

EID: 0012086615     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472283     Document Type: Article

References (5)

1. R. Gontin, "EUV source requirements", SEMATECH International EUV Source Workshop, 03 March 2002, Santa Clara, CA, USA
2. H. M. Hertz, M. Bergtaud, B. A. M. Hansson, L. Rymell, Proc. SPIE 3767, No. 01, 2-9 (1999)
3. G. Schriever, M. Rahe, U. Stature, D. Basting, O. Khristoforov, A. Vinokhodov, V. Borisov, "Compact Z-pinch EUV source for photolithography", Proc. SPIE 4343, 615-620 (2001)
4. rd International Workshop on EUV Lithography, 29-30 October 2001, Kunibiki Messe, Matsue-shi, Shimane, Japan
5. V. M. Borisov, U. Stature, I. Abroad, S. Goetze, A.S. Ivanov, O.B. Khristoforov, J. Kleinschmidt, V. Korobotchko, J. Ringling, G. Schriever, A.Y. Vinokhodov, "Development of high power EUV sources for lithography", Proc. SPIE 4688 (2002), No. 73