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Volumn 86, Issue 5, 2005, Pages 1-3

Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; CHARACTERIZATION; MATHEMATICAL MODELS; PLASMAS; TIN; ULTRAVIOLET RADIATION;

EID: 20844446307     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1856697     Document Type: Article
Times cited : (126)

References (18)
  • 1
    • 18644372336 scopus 로고    scopus 로고
    • Wiley, West Sussex
    • I. C. E. Turcu and J. B. Dance, (Wiley, West Sussex, 1999), Chap.
    • (1999)
    • Turcu, I.C.E.1    Dance, J.B.2
  • 3
    • 0032606817 scopus 로고    scopus 로고
    • C. Rischel, A. Rousse, I. Uschmann, P. A. Albouy, J. P. Geindre, P. Audebert, J. C. Gauthier, E. Forster, J. L. Martin, and A. Antonetti, Nature (London) 0028-0836 10.1038/37317 390, 490 (1997): A. H. Chin, R. W. Schoenlein, T. E. Glover, P. Balling, W. P. Leemans, and C. V. Shank, Phys. Rev. Lett. 83, 336 (1999).
    • (1999) Phys. Rev. Lett. , vol.83 , pp. 336
    • Chin, A.H.1    Schoenlein, R.W.2    Glover, T.E.3    Balling, P.4    Leemans, W.P.5    Shank, C.V.6
  • 5
    • 18644362983 scopus 로고    scopus 로고
    • Proceeding of EUV Lithography Source Workshop
    • V. Banine, Proceeding of EUV Lithography Source Workshop, 2002, International SEMATECH (www.sematech.org).
    • (2002)
    • Banine, V.1
  • 17
    • 18644380899 scopus 로고    scopus 로고
    • http:www.jenoptik.deenindex.html.
  • 18
    • 18644364519 scopus 로고    scopus 로고
    • Proceeding of EUV Lithography Source Workshop, International SEMATECH
    • K. Nishihara, Proceeding of EUV Lithography Source Workshop, 2003, International SEMATECH, (www.sematech.org).
    • (2003)
    • Nishihara, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.