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Volumn 5826, Issue , 2005, Pages 154-164

EUV laser produced plasma source development for lithography

Author keywords

Euv source; Laser produced plasma; Pre pulse; Tin

Indexed keywords

BANDWIDTH; CERAMIC MATERIALS; LASER PRODUCED PLASMAS; LIGHT EMISSION; PLASMA SOURCES; TIN; ULTRAVIOLET RADIATION;

EID: 27644576783     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.604853     Document Type: Conference Paper
Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.