Extreme ultraviolet spectroscopy of a laser plasma source for lithography

Physica Scripta

Volumn 57, Issue 2, 1998, Pages 276-282

  Shevelko, A P ^a,c   Shmaenok, L A ^a,d   Churilov, S S ^b   Bastiaensen, R K F J ^a   Bijkerk, F ^a  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b INSTITUTE OF SPECTROSCOPY   (Russian Federation)

^c LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

^d IOFFE INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRANSITIONS; IONIZATION; LASERS; LITHOGRAPHY; SPECTRUM ANALYSIS; TEMPERATURE; ULTRAVIOLET SPECTROSCOPY;

EXTREME ULTRAVIOLET SPECTROSCOPY; KRYPTON FLUORIDE LASER PLASMA SOURCE; ROWLAND GRAZING INCIDENCE SPECTROGRAPH;

PLASMA SOURCES;

EID: 0031996755     PISSN: 00318949     EISSN: None     Source Type: Journal    
DOI: 10.1088/0031-8949/57/2/023     Document Type: Article

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