Evaluation of ion projection using heavy ions suitable for resistless patterning of thin magnetic films

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 295-300

  Bruenger, W H ^a   Dzionk, C ^a   Berger, R ^b   Grimm, H ^b   Dietzel, A ^b   Letzkus, F ^c   Springer, R ^c  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^b IBM   (Germany)

^c Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

Ion intermixing; Ion projection lithography; Magnetic storage; Patterned magnetic media

Indexed keywords

COMPUTER SOFTWARE; HARD DISK STORAGE; HEAVY IONS; ION BOMBARDMENT; MAGNETIC THIN FILMS; MASKS; MICROSCOPIC EXAMINATION; MONTE CARLO METHODS; SURFACE ROUGHNESS;

ION PROJECTION LITHOGRAPHY;

ION BEAM LITHOGRAPHY;

EID: 0036643935     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00565-8     Document Type: Conference Paper

References (7)

1. High resolution magnetic patterning using focused ion beam irradiation
2. Ion beam patterning of magnetic films using stencil masks
3. Ion projection lithography for resistless patterning of thin magnetic films
4. Ion induced magnetization reorientation in Co/Pt multilayers for patterned media
5. Dry etch improvements in the SOI wafer flow process for IPL stencil mask fabrication