Multicusp ion source for Ion Projection Lithography

Proceedings of the IEEE Particle Accelerator Conference

Volumn 4, Issue , 1999, Pages 2575-2577

  Lee, Y ^a   Leung, K N ^a   Williams, M D ^a   Bruenger, W H ^a   Fallmann, W ^a   Loschner, H ^a   Stengl, G ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; INTEGRATED CIRCUIT MANUFACTURE; ION SOURCES;

ION PROJECTION LITHOGRAPHY (IPL);

ION BEAM LITHOGRAPHY;

EID: 0033347813     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/pac.1999.792782     Document Type: Conference Paper

References (12)