Finite element simulation of ion-beam lithography mask fabrication

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 485-488

  Tejeda, R ^a   Frisque, G ^a   Engelstad, R ^a   Lovell, E ^a   Haugeneder, E ^b   Loschner H ^b  

^a University of Wisconsin Madison   (United States)

^b Ionen Mikrofabrikations Systeme GmbH   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; ION BEAM LITHOGRAPHY;

ION BEAM PROJECTION LITHOGRAPHY (IPL);

MASKS;

EID: 0033132696     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00046-5     Document Type: Article

References (5)

1. 1. Fisher, A., Sprague, M., Engelstad, R., Laird, D., and Nash, S., Proceedings of SPIE, Emerging Lithographic Technologies, Vol. 3048, pp. 288-298, 1997.
2. 2. Fisher, A., Engelstad, R., and Lovell, E., Proceedings of SPIE, Emerging Lithographic Technologies II, Vol. 3331, pp. 559-567, 1998.
3. 3. Rangelow, I. W., Shi, F., Volland, B., Soßna, E., Petrashenko, A., Hudek, P., Sunyk, R., Springer, R., Gross, G., Oelmann, A., Unger, G., Ehrmann, A., Löschner, H., Tejeda, R., Lovell, E., and Engelstad, R., to appear in J. Vac. Sci. Technol. B, 1998.
4. 4. Butschke, J., Ehrmann, A., Höfflinger, B., Irmscher, M., Käsmaier R., Letzkus, F., Löschner, H., Mathuni, J., Reuter, C., Schomburg, C., and Springer, R., submitted to Microelectron. Eng., 1999.
5. 5. Tejeda, R., Engelstad, R., Lovell, E., Haugeneder, E., and Löschner, H., submitted to Microelectron. Eng., 1999.