Ion projection lithography for resistless patterning of thin magnetic films

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 605-608

  Bruenger, W H ^a   Torkler, M ^a   Dzionk, C ^a   Terris, B D ^b   Folks, L ^b   Weller, D ^b   Rothuizen, H ^c   Vettiger, P ^c   Stangl, G ^d   Fallmann, W ^e  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c IBM RESEARCH ZURICH   (Switzerland)

^d VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^e NONE

Author keywords

[No Author keywords available]

Indexed keywords

GOLD; HELIUM; ION BOMBARDMENT; MAGNETIC THIN FILMS; METALLIC FILMS; MICROSCOPIC EXAMINATION; POLYCRYSTALLINE MATERIALS;

GOLD FILM; ION PROJECTION LITHOGRAPHY; MAGNETIC FORCE MICROSCOPY; RESISTLESS PATTERNING;

ION BEAM LITHOGRAPHY;

EID: 0034205525     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00410-X     Document Type: Article

References (7)

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2. 1. P.R. Krauss, S.Y. Chou, J. Vac. Sci. Techn. B13, 2850 (1995), R.M.H. New, R.F.W. Pease, and R.L. White, J. Vac. Sci. Techn. B 13, 1089 (1995)
3. 2. S.Y. Chou, Proc. IEEE 85, 652 (1997), L.Kong, L. Zhuang and S.Y. Chou, IEEE Trans. Magn. 33, 3019 (1997)
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7. 5. B.D. Terris et al, J. Appl. Phys., to be published