Low-temperature deposition of hydrogenated amorphous silicon in an electron cyclotron resonance reactor for flexible displays

Proceedings of the IEEE

Volumn 93, Issue 7, 2005, Pages 1364-1373

  Flewitt, Andrew J ^a   Milne, William I ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Amorphous materials; Displays; Plasma chemical vapor deposition (CVD); Thin film transistors (TFTs)

Indexed keywords

AMORPHOUS SILICON; ELECTRON CYCLOTRON RESONANCE; LOW TEMPERATURE EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; THIN FILM TRANSISTORS;

DEFECT DENSITY; PLASTIC SUBSTRATES; STATE CONDUCTION; WAVELENGTH;

LIQUID CRYSTAL DISPLAYS;

EID: 23244438512     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPROC.2005.851533     Document Type: Conference Paper

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