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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 2, 1997, Pages 298-306

Effect of ion bombardment in very-high frequency glow discharge on growth and properties of SiHx films

(6) Kosarev, A I a Smirnov, A S b Abramov, A S a Vinogradov, A J a Ustavschikov, A Yu c Shutov, M V a

a IOFFE INSTITUTE (Russian Federation)

b ST PETERSBURG STATE INSTITUTE OF TECHNOLOGY TECHNICAL UNIVERSITY (Russian Federation)

c PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031483278 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.580484 Document Type: Article

Times cited : (14)

References (13)

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