Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography

Journal of Applied Physics

Volumn 97, Issue 5, 2005, Pages

  Teh, W H ^a,b   Durig U ^a   Drechsler, U ^a   Smith, C G ^b   Guntherodt H J ^c  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF BASEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

LASER-PULSE ENERGY; MICROSTEREOLITHOGRAPHY; PROTOLYSIS; SCANNING SPEED;

ASPECT RATIO; DIFFRACTION; LASER PULSES; LIGHT ABSORPTION; PHOTONS; PHOTOPOLYMERIZATION; PHOTORESISTS; SOLIDIFICATION;

LITHOGRAPHY;

EID: 20444457021     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1856214     Document Type: Article

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