Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure

Optical Engineering

Volumn 38, Issue 2, 1999, Pages 334-338

  Yablonovitch, Eli ^a   Vrijen, Rutger B ^a  

^a University of California   (United States)

Author keywords

Photolithography; Two photon absorption

Indexed keywords

EID: 0003082641     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.602092     Document Type: Article

References (10)

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