Combining microstereolithography and thick resist UV lithography for 3D microfabrication

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1998, Pages 18-23

  Bertsch, A ^a   Lorenz, H ^a   Renaud, P ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; LITHOGRAPHY; MICROSTRUCTURE; ULTRAVIOLET RADIATION;

MICROSTEREOLITHOGRAPHY; ULTRAVIOLET LITHOGRAPHY;

MICROELECTRONIC PROCESSING;

EID: 0031653880     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)