Chemically amplified positive resists for two-photon three-dimensional microfabrication

Advanced Materials

Volumn 15, Issue 6, 2003, Pages 517-521

  Yu, Tianyue ^a   Ober, Christopher K ^a   Kuebler, Stephen M ^b   Zhou, Wenhui ^b   Marder, Seth R ^b   Perry, Joseph W ^b  

^a Cornell University   (United States)

^b UNIVERSITY OF ARIZONA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COMPOSITION; FLUORESCENCE; LASER BEAM EFFECTS; MICROELECTROMECHANICAL DEVICES; PHOTOLITHOGRAPHY; PHOTONS; POLYMETHYL METHACRYLATES; PRECIPITATION (CHEMICAL);

BUTYL METHACRYLATE; PHOTOACID GENERATOR; TETRAHYDROPYRANYLMETHACRYLATE; THREE DIMENSIONAL MICROFABRICATION; TWO PHOTON EXCITATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0037451514     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200390120     Document Type: Article

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