Near-field two-photon nanolithography using an apertureless optical probe

Applied Physics Letters

Volumn 81, Issue 19, 2002, Pages 3663-3665

  Yin, Xiaobo ^a   Fang, Nicholas ^a   Zhang, Xiang ^a   Martini, Ignacio B ^a   Schwartz, Benjamin J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMMERCIAL PHOTORESIST; FAR FIELD; FIELD ENHANCEMENT; FS LASER PULSE; NANO SCALE; NEAR FIELD OPTICAL MICROSCOPE; NEAR-FIELD; NM RESOLUTION; OPTICAL PROBE; SPATIAL RESOLUTION; TWO PHOTON; TWO-PHOTON ABSORPTIONS; TWO-PHOTON LITHOGRAPHY;

LASER PULSES; PHOTORESISTS; PROBES; TWO PHOTON PROCESSES;

PHOTONS;

EID: 79956057132     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1519329     Document Type: Article

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